Highly metastable amorphous or near-amorphous ternary films (mictamict alloys)

被引:41
作者
Nicolet, MA [1 ]
Giauque, PH [1 ]
机构
[1] CALTECH, Pasadena, CA 91125 USA
关键词
amorphous films; high metastability; mictamict alloys; ternary films; diffusion barriers;
D O I
10.1016/S0167-9317(00)00468-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thin ternary films of the generic composition (early transition metal)-Si-(nitrogen or oxygen) can be synthesized that have an amorphous or near-amorphous structure and are highly resistant to crystallization upon thermal annealing. Common to all of them is the existence of two compounds that form a quasi-binary system. Some known properties of these films are reviewed. Their similarity with amorphous binary metallic alloys is emphasized. Many ternary systems should exist with which such amorphous films can be made. The name 'mictamict' is proposed to identify this general class of materials. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:357 / 367
页数:11
相关论文
共 39 条
[1]   REACTIVELY SPUTTERED WSIN FILM SUPPRESSES AS AND GA OUTDIFFUSION [J].
ASAI, K ;
SUGAHARA, H ;
MATSUOKA, Y ;
TOKUMITSU, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (05) :1526-1529
[2]   THERMODYNAMIC CONSIDERATIONS IN REFRACTORY METAL-SILICON-OXYGEN SYSTEMS [J].
BEYERS, R .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (01) :147-152
[3]   Characteristics of ion-beam-sputtered high-refractive-index TiO2-SiO2 mixed films [J].
Chao, S ;
Wang, WH ;
Hsu, MY ;
Wang, LC .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1999, 16 (06) :1477-1483
[4]   Mixed films of TiO2-SiO2 deposited by double electron-beam coevaporation [J].
Chen, JS ;
Chao, S ;
Kao, JS ;
Niu, H ;
Chen, CH .
APPLIED OPTICS, 1996, 35 (01) :90-96
[5]   Method for fabricating a low stress x-ray mask using annealable amorphous refractory compounds [J].
Dauksher, WJ ;
Resnick, DJ ;
Cummings, KD ;
Baker, J ;
Gregory, RB ;
Theodore, ND ;
Chan, JA ;
Johnson, WA ;
Mogab, CJ ;
Nicolet, MA ;
Reid, JS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :3103-3108
[6]   Reliability of industrial packaging for microsystems [J].
de Reus, R ;
Christensen, C ;
Weichel, S ;
Bouwstra, S ;
Janting, J ;
Eriksen, GF ;
Dyrbye, K ;
Brown, TR ;
Krog, JP ;
Jensen, OS ;
Gravesen, P .
MICROELECTRONICS RELIABILITY, 1998, 38 (6-8) :1251-1260
[7]   Improving the properties of titanium nitride by incorporation of silicon [J].
Diserens, M ;
Patscheider, J ;
Levy, F .
SURFACE & COATINGS TECHNOLOGY, 1998, 108 (1-3) :241-246
[8]  
FLEMING JG, 1996, ADV METALLIZATION IN, P369
[9]   Reactively sputtered Ru-Si-O films [J].
Gasser, SM ;
Kolawa, E ;
Nicolet, MA .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (04) :1974-1981
[10]   Instability of amorphous Ru-Si-O thin films under thermal oxidation [J].
Gasser, SM ;
Ruiz, R ;
Kolawa, E ;
Nicolet, MA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (04) :1546-1548