The Dresden EBIT: An ion source for materials research and technological applications of low-energy highly charged ions

被引：10

作者：

Werner, T

Zschornack, G

Grossmann, F

Ovsyannikov, VP

Ullmann, F

机构：

[1] Tech Univ Dresden, Inst Kern & Teilchenphys, D-01069 Dresden, Germany

[2] LEYBOLD Syst & Serv GmbH Dresden, D-01109 Dresden, Germany

[3] Joint Inst Nucl Res, LHE, Dubna, Russia

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2001年 / 178卷

关键词：

highly charged ions; electron beam ion trap; X-ray spectroscopy; ion extraction; technological applications;

D O I：

10.1016/S0168-583X(01)00515-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We report on a room temperature electron beam ion trap (DEBIT: Dresden EBIT). The construction of the DEBIT allows it to produce dense electron beams with current densities of at least 500 A cm(-2) and an ionization factor of 5 x 10(21) cm(-2) for electron beam energies up to 15 keV. Ions like Fe26+. Kr34+. Xe49+ and Hg70+ have been detected by X-ray spectrometry. The developed device has a high potential for investigations in nanomechanics. potential sputtering, information technology, ion beam lithography, etc., as it was demonstrated by different authors in studies utilizing a cryogenic EBIT or ECR ion sources. To enable adequate investigations a first compact ion extraction system for the DEBIT is described. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：260 / 264

页数：5

共 18 条

[1] Molecular fragmentation by slow highly charged ion impact [J].

DuBois, RD ;

Schlathölter, T ;

Hadjar, O ;

Hoekstra, R ;

Morgenstern, R ;

Doudna, CM ;

Feeler, R ;

Olson, RE .

EUROPHYSICS LETTERS, 2000, 49 (01) :41-47

[2] Masked ion beam lithography with highly charged ions [J].

Gillaspy, JD ;

Parks, DC ;

Ratliff, LP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3294-3297

[3]

HUGHES I, 1995, PHYS WORLD, V8, P43

[4] STRONG CHARGE-STATE DEPENDENCE OF H+ AND H-2(+) SPUTTERING INDUCED BY SLOW HIGHLY-CHARGED IONS [J].

KAKUTANI, N ;

AZUMA, T ;

YAMAZAKI, Y ;

KOMAKI, K ;

KUROKI, K .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1995, 96 (3-4) :541-544

[5] ELECTRON-EMISSION AND IMAGE-CHARGE ACCELERATION FOR THE IMPACT OF VERY HIGHLY-CHARGED IONS [J].

KURZ, H ;

AUMAYR, F ;

WINTER, HP ;

SCHNEIDER, D ;

BRIERE, MA ;

MCDONALD, JW .

PHYSICAL REVIEW A, 1994, 49 (06) :4693-4702

[6] Projection x-ray microscope powered by highly charged ions [J].

Marrs, RE ;

Schneider, DH ;

McDonald, JW .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (01) :204-209

[7] First investigations of a warm electron beam ion trap for the production of highly charged ions [J].

Ovsyannikov, VP ;

Zschornack, G .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (06) :2646-2651

[8] Highly charged ions produced in a warm electron beam ion trap [J].

Ovsyannikov, VP ;

Zschornack, G ;

Grossmann, F ;

Landgraf, S ;

Ullmann, F ;

Werner, T .

REVIEW OF SCIENTIFIC INSTRUMENTS, 2000, 71 (02) :690-692

[9] A novel room temperature electron beam ion trap for atomic physics and materials research [J].

Ovsyannikov, VP ;

Zschornack, G ;

Grossmann, F ;

Koulthachev, OK ;

Landgraf, S ;

Ullmann, F ;

Werner, T .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 161 :1123-1127

[10]

Parks DC, 1998, NUCL INSTRUM METH B, V134, P46, DOI 10.1016/S0168-583X(98)80032-3

← 1 2 →