Strained-layer InGaAs quantum-well heterostructure lasers

被引:31
作者
Coleman, JJ [1 ]
机构
[1] Univ Illinois, Dept Elect & Comp Engn, Microelect Lab, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
quantum-well heterostructure; semiconductor laser; stained-layer laser;
D O I
10.1109/2944.902149
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The incorporation of intentional strain in heterostructure lasers was almost unheard of a decade ago or so and considered a problem to be avoided. Advances in both epitaxial crystal growth technology and the understanding of the physics and reliability of these materials have led to a remarkable increase in the commercial use of strained-layer lasers. The industry has benefited from an increase in the available range of emission wavelengths from quantum-well diode lasers and dramatic improvement in their time-zero performance. In this paper, we review the characteristics of strained-layer InGaAs quantum-well heterostructure lasers that have resulted in the emergence of this important technology.
引用
收藏
页码:1008 / 1013
页数:6
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