Mononuclear mixed β-ketoester-alkoxide compound of titanium as a promising precursor for low-temperature MOCVD of TiO2 thin films

A new monomeric Ti precursor, bis-isopropoxy-bis-tertiarybutyl-acetoacetatetitanium, designed by replacing the terminal alkyl groups, in a β-diketonate by an alkoxy group, for low-temperature metallorganic chemical vapor deposition (MOCVD) of TiO thin films, was reported. The [Ti(OiPr) 2(tbaoac)2] was prepared by using titanium isopropoxide and tert-butylacetoacetate (tbaoacH) by modifying standard synthetic procedures. It exhibits as a pale-yellow crystalline solid at room temperature, having a melting point of 58°C. The new Ti complex was highly soluble in common organic solvents, making it suitable for liquid injection metal-organic chemical vapor deposition (MOCVD) applications.