Towards sub-10 nm resolution zone plates using the overlay nanofabrication processes

被引:5
作者
Chao, Weilun [1 ]
Anderson, Erik H. [1 ]
Fischer, Peter [1 ]
Kim, Dong-Hyun [2 ]
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, 1 Cyclotron Rd,MS 2-400, Berkeley, CA 94720 USA
[2] Chungbuk Natl Univ, Dept Phys, Cheongju 361763, Chungbuk, South Korea
来源
ADVANCED FABRICATION TECHNOLOGIES FOR MICRO/NANO OPTICS AND PHOTONICS | 2008年 / 6883卷
关键词
zone plates; spatial resolution; x-ray microscopy; electron beam lithography; overlay fabrication technique;
D O I
10.1117/12.768878
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Soft x-ray zone plate microscopy has proven to be a valuable imaging technique for nanoscale studies. It complements nano-analytic techniques such as electron and scanning probe microscopies. One of its key features is high spatial resolution. We developed an overlay nanofabrication process which allows zone plates of sub-20 nm zone widths to be fabricated. Zone plates of 15 nm outer zones were successfully realized using this process, and sub-15 nm resolution was achieved with these zone plates. We extend the overlay process to fabricating zone plates of 12 nm outer zones, which is expected to achieve 10 nm resolution. In addition, we have identified a pathway to realizing sub-10 nm resolution, high efficiency zone plates with tilted zones using the overlay process.
引用
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页数:8
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