Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmas

被引：59

作者：

Takashima, S

Arai, S

Hori, M

Goto, T

Kono, A

Ito, M

Yoneda, K

机构：

[1] Nagoya Univ, Dept Quantum Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan

[2] Nagoya Univ, Ctr Cooperat Res Adv Sci & Technol, Chikusa Ku, Nagoya, Aichi 4648603, Japan

[3] Wakayama Univ, Dept Optomechatron, Wakayama 6408510, Japan

[4] Nippon Laser & Elect Lab, Atsuta Ku, Nagoya, Aichi 4560032, Japan

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2001年 / 19卷 / 02期

关键词：

Absorption spectroscopy - Cathodes - Molecular dynamics - Molecular structure - Nitrogen - Vacuum applications;

D O I：

10.1116/1.1340655

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have developed a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure nitrogen molecule (N-2) microdischarge hollow cathode lamp (N-2 MHCL) as a light source of the atomic nitrogen (N) resonance Lines for measuring absolute N densities in process plasmas. The estimations of self-absorption and the emission line profiles of the N-2 MHCL, which are necessary for absolute N density determination, were carried out. The measurement of absolute N densities have been demonstrated for an inductively coupled N-2 plasma using the VUVAS system employing the N2MHCL. (C) 2001 American Vacuum Society.

引用

页码：599 / 602

页数：4

共 13 条

[1] A microwave plasma source of neural nitrogen atoms [J].