Growth of 6H-SIC crystals along the [011-5] direction

被引:20
作者
Herro, ZG
Epelbaum, BM
Bickermann, M
Seitz, C
Magerl, A
Winnacker, A
机构
[1] Univ Erlangen Nurnberg, Dept Mat Sci 6, D-91058 Erlangen, Germany
[2] Univ Montpellier 2, Grp Etude Semicond, F-34095 Montpellier, France
[3] Univ Erlangen Nurnberg, Dept Crystallog & Struct Phys, D-91058 Erlangen, Germany
关键词
growth from vapor; natural crystal growth; silicon carbide;
D O I
10.1016/j.jcrysgro.2004.12.024
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have investigated bulk growth of 6H-SiC crystals along the [0115] direction. The (0115) facet was obtained in a natural way during growth experiments using close-to-equilibrium conditions which facilitate facets appearance. Seeded growth using (0115)-oriented seeds was demonstrated. The occurrence of the (0115) facet depended strongly on the thermal field geometry. When tailoring a flat thermal field a big facet of 15 mm in diameter was obtained. Hollow micropipe defects propagating along the c-axis of the seed were vanished in the grown crystal leading to a completely micropipe-free region. Polytype information seemed to be transmitted along the c-axis whereas hollow cores propagated along the usual growth direction due to voids migration. Growth along the [0115] direction is considered to be very promising for preparation of micropipe-free SIC crystals. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:496 / 503
页数:8
相关论文
共 20 条
[1]   On the mechanisms of micropipe and macrodefect transformation in SiC during liquid phase treatment [J].
Epelbaum, BM ;
Hofmann, D .
JOURNAL OF CRYSTAL GROWTH, 2001, 225 (01) :1-5
[2]   Natural crystal habit and preferential growth directions during PVT of silicon carbide [J].
Herro, ZG ;
Epelbaum, BM ;
Bickermann, M ;
Masri, P ;
Seitz, C ;
Magerl, A ;
Winnacker, A .
SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 2004, 457-460 :111-114
[3]   AFM investigation of interface step structures on PVT-grown (0001)Si 6H-SiC crystals [J].
Herro, ZG ;
Epelbaum, BM ;
Weingärtner, R ;
Bickermann, M ;
Masri, P ;
Winnacker, A .
JOURNAL OF CRYSTAL GROWTH, 2004, 270 (1-2) :113-120
[4]   Effective increase of single-crystalline yield during PVT growth of SiC by tailoring of temperature gradient [J].
Herro, ZG ;
Epelbaum, BM ;
Bickermann, M ;
Masri, P ;
Winnacker, A .
JOURNAL OF CRYSTAL GROWTH, 2004, 262 (1-4) :105-112
[5]   Analysis on the formation and elimination of filamentary and planar voids in silicon carbide bulk crystals [J].
Hofmann, D ;
Bickermann, M ;
Hartung, W ;
Winnacker, A .
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 :445-448
[6]   SiC-bulk growth by physical-vapor transport and its global modelling [J].
Hofmann, D ;
Eckstein, R ;
Kolbl, M ;
Makarov, Y ;
Muller, SG ;
Schmitt, E ;
Winnacker, A ;
Rupp, R ;
Stein, R ;
Volkl, J .
JOURNAL OF CRYSTAL GROWTH, 1997, 174 (1-4) :669-674
[7]  
Kimoto T, 2002, MATER SCI FORUM, V433-4, P197, DOI 10.4028/www.scientific.net/MSF.433-436.197
[8]   Flux-controlled sublimation growth by an inner guide-tube [J].
Kitou, Y ;
Bahng, W ;
Kato, T ;
Nishizawa, S ;
Arai, K .
SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 :83-86
[9]  
KNIPPENBERG WF, 1963, PHILIPS RES REP, V18, P257
[10]  
Lely J A., 1958, US Patent, Patent No. 2854364