Current Status of Nonvolatile Semiconductor Memory Technology

被引:65
作者
Fujisaki, Yoshihisa [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Tokyo 1858601, Japan
关键词
PHASE-CHANGE MEMORY; LOW-POWER; RESISTANCE; OPERATION; FILMS; CELL;
D O I
10.1143/JJAP.49.100001
中图分类号
O59 [应用物理学];
学科分类号
070305 [高分子化学与物理];
摘要
In this report, an overview of the current status of nonvolatile semiconductor memory technology is presented. We are reaching the integration limit of flash memories, and many new types of memories to replace conventional flash memories have been proposed. Unlike flash memories, new nonvolatile memories do not require electric charge storing. The possibility of phase-change random access memory (PRAM) or resistive-change RAM (ReRAM) replacing ultrahigh-density NAND flash memories has been discussed; however, there are many issues to overcome, making the replacement difficult. Nonetheless, ferroelectric RAMs (FeRAMs) and MRAMs are gradually penetrating into fields where the shortcomings of flash memories, such as high operating voltage, slow rewriting speed, and limited number of rewrites, make their use inconvenient. For the successful application of new nonvolatile semiconductor memories, they must be practically utilized in new fields in which flash memories are not applicable, and the technology for them must be developed. (C) 2010 The Japan Society of Applied Physics
引用
收藏
页码:1000011 / 1000014
页数:14
相关论文
共 88 条
[61]
PREPARATION OF PB(ZR,TI)O-3 THIN-FILMS ON ELECTRODES INCLUDING IRO2 [J].
NAKAMURA, T ;
NAKAO, Y ;
KAMISAWA, A ;
TAKASU, H .
APPLIED PHYSICS LETTERS, 1994, 65 (12) :1522-1524
[62]
REVERSIBLE ELECTRICAL SWITCHING PHENOMENA IN DISORDERED STRUCTURES [J].
OVSHINSKY, SR .
PHYSICAL REVIEW LETTERS, 1968, 21 (20) :1450-+
[63]
Lanthanum-substituted bismuth titanate for use in non-volatile memories [J].
Park, BH ;
Kang, BS ;
Bu, SD ;
Noh, TW ;
Lee, J ;
Jo, W .
NATURE, 1999, 401 (6754) :682-684
[64]
Resistance switching characteristics for nonvolatile memory operation of binary metal oxides [J].
Park, In-Sung ;
Kim, Kyong-Rae ;
Lee, Sangsul ;
Ahn, Jinho .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (4B) :2172-2174
[65]
Pellizzer F, 2004, 2004 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, P18
[66]
Pellizzer F., 2006, S VLSI TECHNOL DIG T, P122, DOI [10.1109/VLSIT.2006.1705247, DOI 10.1109/VLSIT.2006.1705247]
[67]
Strong electron correlation effects in nonvolatile electronic memory devices -: art. no. 033510 [J].
Rozenberg, MJ ;
Inoue, IH ;
Sánchez, MJ .
APPLIED PHYSICS LETTERS, 2006, 88 (03) :1-3
[68]
A Ta2O5 solid-electrolyte switch with improved reliability [J].
Sakamoto, Toshitsugu ;
Banno, Naoki ;
Iguchi, Noriyuki ;
Kawaura, Hisao ;
Sunamura, Hiroshi ;
Fujieda, Shinji ;
Terabe, Kazuya ;
Hasegawa, Tsuyoshi ;
Aono, Masakazu .
2007 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, 2007, :38-+
[69]
Hysteretic current-voltage characteristics and resistance switching at a rectifying Ti/Pr0.7Ca0.3MnO3 interface [J].
Sawa, A ;
Fujii, T ;
Kawasaki, M ;
Tokura, Y .
APPLIED PHYSICS LETTERS, 2004, 85 (18) :4073-4075
[70]
Resistive switching in transition metal oxides [J].
Sawa, Akihito .
MATERIALS TODAY, 2008, 11 (06) :28-36