Edge diffraction enhanced printability in x-ray nanolithography

被引：13

作者：

Chen, Y ^{[1
]}

Simon, G ^{[1
]}

Haghiri-Gosnet, AM ^{[1
]}

Carcenac, F ^{[1
]}

Decanini, D ^{[1
]}

Rousseaux, F ^{[1
]}

Launois, H ^{[1
]}

机构：

[1] CNRS, Microstruct & Microelect Lab, F-92225 Bagneux, France

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.590489

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We study the edge diffraction enhanced printability in x-ray nanolithography under both proximity and soft-contact printing conditions. Theoretical modeling shows that the gap dependence of the edge diffraction is closely related to that bf the minimum linewidth described by the common Fresnel formula and that the edge diffraction can significantly enhance the image contrast of nanometer scale features. Experimental results are also presented to show high resolution and high aspect ratio printability. Furthermore, a method for fabricating ultrahigh resolution and dense structure is discussed based on edge diffraction enhanced printability with very thin absorber masks. (C) 1998 American Vacuum Society. [S0734-211X(98)07706-3].

引用

页码：3521 / 3525

页数：5

共 12 条

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