Accelerated stress testing of a-Si:H pixel circuits for AMOLED displays

被引:20
作者
Sakariya, K [1 ]
Ng, CKM [1 ]
Servati, P [1 ]
Nathan, A [1 ]
机构
[1] Univ Waterloo, Dept Elect & Comp Engn, Waterloo, ON N2L 3G1, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
accelerated testing; active matrix; amorphous silicon; degradation; organic light-emitting diode; thin film transistor; threshold voltage;
D O I
10.1109/TED.2005.859635
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electronics reliability testing is traditionally carried out by accelerating the failure mechanisms using high temperature and high stress, and then predicting the real-life performance with the Arrhenius model. Such methods have also been applied to organic light-emitting diode (OLED) testing to predict lifetimes of tens of thousands of hours. However, testing the active matrix OLED thin-film transistor (TFT) backplane is a unique and complex case where standard accelerated testing cannot be directly applied. This is because the failure mechanism of pixel circuits is governed by multiple material and device effects, which are compounded by the self-compensating nature of the circuits. In this paper, we define and characterize the factors affecting the primary failure mechanism and develop a general method for accelerated stress testing of TFT pixel circuits in a-Si AMOLED displays. The acceleration factors derived are based on high electrical and temperature stress, and can be used to significantly reduce the testing time required to guarantee a 30,000-h display backplane lifespan..
引用
收藏
页码:2577 / 2583
页数:7
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