A method to maintain wafer alignment precision during adhesive wafer bonding

被引:39
作者
Niklaus, F [1 ]
Enoksson, P [1 ]
Kälvesten, E [1 ]
Stemme, G [1 ]
机构
[1] Royal Inst Technol, Dept Signals Sensors & Syst, SE-10044 Stockholm, Sweden
关键词
alignment; wafer alignment; wafer bond equipment; adhesive bonding; wafer bonding; polymer bonding;
D O I
10.1016/S0924-4247(03)00356-X
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, a novel method is presented that prevents aligned wafers from shifting relative to each other during adhesive bonding. The attainable pre-bond wafer alignment accuracy on commercially available bonding equipment is typically 2-5 mum. However, in adhesive wafer bonding, the intermediate adhesive material must exist in a liquid-like state to wet the wafer surfaces and thereby achieve bonding. When pressing the wafers together with the bond chucks during the bonding process it is practically inevitable that shear forces occur, which act in parallel to the bond line. The intermediate liquid adhesive material cannot counteract the shear forces, thus, the wafers move relative to each other. Consequently, the achievable alignment accuracy in adhesive wafer bonding is typically less than 15 mum using commercial bonding equipment. A novel method has been developed that utilises structures at the wafer surfaces to provide areas with solid-state material contact between the two wafers during the bonding process. The resulting frictional forces prevent the wafers from shifting relative to each other during the time the intermediate adhesive material is in a liquid state. Thus, the pre-bond alignment accuracy of 2-5 mum can be maintained during adhesive wafer bonding using standard wafer bonding equipment as compared to a wafer alignment accuracy of 15-50 mum when no frictional structures are used. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:273 / 278
页数:6
相关论文
共 16 条
[1]  
Audet S. A., 1997, P 1997 INT C SOL STA, P287
[2]  
BOOTH E, 1995, P SEM WAF BOND SCI T, P201
[3]  
Chou TKA, 2001, TRANSDUCERS '01: EUROSENSORS XV, DIGEST OF TECHNICAL PAPERS, VOLS 1 AND 2, P1570
[4]   FUSING SILICON-WAFERS WITH LOW MELTING TEMPERATURE GLASS [J].
FIELD, LA ;
MULLER, RS .
SENSORS AND ACTUATORS A-PHYSICAL, 1990, 23 (1-3) :935-938
[5]   Novel technology for hybrid integration of photonic and electronic circuits [J].
Matsuo, S ;
Nakahara, T ;
Tateno, K ;
Kurokawa, T .
IEEE PHOTONICS TECHNOLOGY LETTERS, 1996, 8 (11) :1507-1509
[6]   Wafer-level packaging technology for MEMS [J].
Mirza, AR .
ITHERM 2000: SEVENTH INTERSOCIETY CONFERENCE ON THERMAL AND THERMOMECHANICAL PHENOMENA IN ELECTRONIC SYSTEMS, VOL I, PROCEEDINGS, 2000, :113-119
[7]   One micron precision, wafer-level aligned bonding for interconnect, MEMS and packaging applications [J].
Mirza, AR .
50TH ELECTRONIC COMPONENTS & TECHNOLOGY CONFERENCE - 2000 PROCEEDINGS, 2000, :676-680
[8]   Low-temperature wafer-level transfer bonding [J].
Niklaus, F ;
Enoksson, P ;
Griss, P ;
Kälvesten, E ;
Stemme, G .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2001, 10 (04) :525-531
[9]   Low-temperature full wafer adhesive bonding [J].
Niklaus, F ;
Enoksson, P ;
Kälvesten, E ;
Stemme, G .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2001, 11 (02) :100-107
[10]   Low temperature full wafer adhesive bonding of structured wafers [J].
Niklaus, F ;
Andersson, H ;
Enoksson, P ;
Stemme, G .
SENSORS AND ACTUATORS A-PHYSICAL, 2001, 92 (1-3) :235-241