Surface ripple amplification and attenuation by sputtering with diametrically opposed ion fluxes

被引：12

作者：

Carter, G ^{[1
]}

机构：

[1] Univ Salford, Inst Mat, Joele Phys Lab, Salford M5 4WT, Lancs, England

来源：

VACUUM | 2005年 / 79卷 / 1-2期

关键词：

sputtering; surface morphology; ion bombardmcnt; surface ripples; depth profiling;

D O I：

10.1016/j.vacuum.2005.01.011

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Monodirectional, obliquely incident. ion bombardment fluxes can generate travelling wave or ripple structures on surfaces as a result of competition between sputtering erosion effects and relaxation processes. It is shown that if two independent ion fluxes, incident in diametrically opposite directions, are employed then the resulting, surface structure is a static wave with an amplitude which is time modulated and which, periodically. results in a flat surface. This behaviour may be useful in sputter depth profiling applications. (c) 2005 Elsevier Ltd. All rights reserved.

引用

页码：106 / 109

页数：4

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