Tunneling phenomena in carbon nanotube field-effect transistors

被引:172
作者
Knoch, Joachim [1 ]
Appenzeller, Joerg [2 ]
机构
[1] IBM Corp, Zurich Res Lab, CH-8803 Ruschlikon, Switzerland
[2] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2008年 / 205卷 / 04期
关键词
D O I
10.1002/pssa.200723528
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the present article we will discuss the electronic transport properties of carbon nanotube field-effect transistors (CNFETs). Three different device concepts will be studied in more detail: Schottky-barrier CNFETs with metallic source and drain contacts, conventional-type CNFETs with doped nanotube segments as source and drain electrodes and finally a new concept, the tunneling CNFET. As it turns out, tunneling phenomena play a prominent role in all three CNFET designs and determine their electrical behavior to a large extend. In addition, the one-dimensionality of the electronic transport makes them ideally suited for novel device architecture such as the tunneling CNFET. Analytical as well as simulation results will be given and compared with each other and with experimental data in order to explain the different influences on the electronic transport in CNFETs and thus on the device behavior. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:679 / 694
页数:16
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