Interface roughness and polar optical phonon scattering in In0.53Ga0.47As/AlAs/InAs RTDs

被引:11
作者
Lake, R [1 ]
Klimeck, G [1 ]
Blanks, D [1 ]
机构
[1] Raytheon TI Syst, Appl Res Lab, Dallas, TX 75265 USA
关键词
D O I
10.1088/0268-1242/13/8A/046
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The contributions of interface roughness scattering and polar optical phonon scattering to the valley current of In0.53Ga0.47As/AlAs/InAs resonant tunnelling diodes (RTDs) are theoretically found to be comparable. An In0.53Ga0.47As/AlAs/InAS RTD design is suggested to experimentally observe the phonon peak which has never been observed in this material system. Such a device will provide a calibration point for the theoretical calculations.
引用
收藏
页码:A163 / A164
页数:2
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