共 27 条
[13]
Defect formation and structural alternation in modified SiO2 glasses by irradiation with F2 laser or ArF excimer laser
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2000, 18 (06)
:2891-2895
[14]
KHOTIMCHENKO VS, 1987, ZH PRIKL SPEKTROSK, V46, P987
[15]
CHARACTERIZATION OF FLUORINE-DOPED SILICA GLASSES
[J].
JOURNAL OF MATERIALS SCIENCE,
1993, 28 (10)
:2738-2744
[17]
Materials issues for optical components and photomasks in 157 nm lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1999, 17 (06)
:3273-3279
[19]
Effect of Xe2* light (7.2 eV) on the infrared and vacuum ultraviolet absorption properties of hydroxyl groups in silica glass
[J].
PHYSICAL REVIEW B,
1999, 59 (06)
:4066-4073
[20]
Pacchioni G, 2000, NATO SCI SER II-MATH, V2, P161