Hydrogen-defect interactions in Si

被引:22
作者
Estreicher, SK [1 ]
Hastings, JL
Fedders, PA
机构
[1] Texas Tech Univ, Dept Phys, Lubbock, TX 79409 USA
[2] Washington Univ, Dept Phys, St Louis, MO 63130 USA
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1999年 / 58卷 / 1-2期
关键词
molecular-dynamics; hydrogen; H-2; H-2*; vacancies; self-interstitials;
D O I
10.1016/S0921-5107(98)00270-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The interactions between hydrogen and intrinsic defects in silicon are studied using ab-initio (tight-binding) molecular-dynamics simulations in supercells and ab-initio Hartree-Fock in clusters. The configurations, electronic structures, and binding energies of H bound to small vacancy aggregates are calculated. The vacancy (V) and the self-interstitial (I)-both rapid diffusers in Si-efficiently dissociate interstitial H, molecules. At low temperatures, this results in the formation of {V, H, H} or {I, H, H} complexes. At high temperatures, one or both H's may be released as interstitials. Preliminary calculations show that H-2* result from the reaction {I, H, H} + V --> H-2*. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:31 / 35
页数:5
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