Influence of fill gases on the failure rate of gated silicon field emitter arrays

被引:3
作者
Meassick, S
Champaign, H
机构
[1] Department of Engineering, New Mexico Highlands University, Las Vegas
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 03期
关键词
D O I
10.1116/1.588954
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The influence of a variety of background gases on the failure rate of gated field emitter arrays has been investigated. The effects of argon, helium, nitrogen, and xenon were investigated, with pressures ranging from 1X10(-8) to 1X10(-4) Torr. The gated field emitter arrays were operated in dc and pulsed emission modes. The failure rate of gated field emitters is a very strong function of the type of background gas, its pressure, and whether the array was operated in a pulsed or dc bias mode. As expected, the failure rate for all gases increased rapidly as the background pressure increased, but was substantially different for the various gases. The failure rate of arrays increased rapidly as the electron impact ionization cross section of the background gas decreased. The large reduction in failure rates due to operation in a pulsed mode as compared to a de mode of operation, as previously seen for experiments without a background gas, was also evident for all background gases tested. (C) 1996 American Vacuum Society.
引用
收藏
页码:1914 / 1917
页数:4
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