Interferometry of actuated microcantilevers to determine material properties and test structure nonidealities in MEMS

被引:97
作者
Jensen, BD
de Boer, MP
Masters, ND
Bitsie, F
LaVan, DA
机构
[1] Sandia Natl Labs, MEMS & Novel Silicon Sci & Technol Dept, Albuquerque, NM 87185 USA
[2] Sandia Natl Labs, Electromech Engn Dept, Albuquerque, NM 87185 USA
[3] Sandia Natl Labs, Mech Reliabil & Melting Dept, Albuquerque, NM 87185 USA
基金
美国能源部;
关键词
free-standing thin films; in situ characterization; mechanical properties; statistical accuracy assessments;
D O I
10.1109/84.946779
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
By integrating interferometric deflection data from electrostatically actuated microcantilevers with a numerical finite difference model, we have developed a step-by-step procedure to determine values of Young's modulus while simultaneously quantifying nonidealities. The central concept in the methodology is that nonidealities affect the long-range deflections of the beams, which can be determined to near nanometer accuracy. Beam take-off angle, curvature and support post compliance are systematically determined. Young's modulus is then the only unknown parameter, and is directly found. We find an average value of Young's modulus for polycrystalline silicon of 164.3 GPa and a standard deviation of 3.2 GPa (+/-2%), reflecting data from three different support post designs. Systematic errors were assessed and may alter the average value by +/-5%. An independent estimate from grain orientation measurements yielded 163.4-164.4 GPa (the Voigt and Reuss bounds), in agreement with the step-by-step procedure. Other features of the test procedure include that it is rapid, nondestructive, verifiable and requires only a small area on the test chip.
引用
收藏
页码:336 / 346
页数:11
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