Role of Na in the promotion of the Ge(111) surface oxidation

被引：3

作者：

Jeon, D ^{[1
]}

Joo, HW

Hashizume, T

Sakurai, T

机构：

[1] Myong Ji Univ, Dept Phys, Seoul 449728, South Korea

[2] Hitachi Ltd, Adv Res Lab, Hatoyama, Saitama 35003, Japan

[3] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 980, Japan

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1998年 / 66卷 / Suppl 1期

关键词：

D O I：

10.1007/s003390051279

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The role of Na in the promotion of the Ge(111) surface oxidation has been studied. The sites that reacted with oxygen were recognized by the contrast change in the electron tunneling images. On the clean Ge(111) surface, oxidation began at the defect sites and domain boundaries. With Na on the surface, the initial oxidation also occurred at the sites where Na adsorbed. As the oxygen dosage increased, the oxidized area expanded laterally from the initial oxidation sites. The result indicates that Na adsorption promoted the surface oxidation by providing extra oxidation centers.

引用

页码：S981 / S984

页数：4

共 11 条

[1] MECHANISM OF ALKALI-PROMOTED OXIDATION OF SILICON [J].