Portable diagnostics for EUV light sources

被引：27

作者：

Stuik, R ^{[1
]}

Constantinescu, R ^{[1
]}

Hegeman, P ^{[1
]}

Jonkers, J ^{[1
]}

Fledderus, HF ^{[1
]}

Banine, V ^{[1
]}

Bijkerk, F ^{[1
]}

机构：

[1] FOM, Inst Plasma Phys Rijnhuizen, NL-3439 MN Nieuwegein, Netherlands

来源：

SOFT X-RAY AND EUV IMAGING SYSTEMS | 2000年 / 4146卷

关键词：

EUV; source; lithography; EUV diagnostics;

D O I：

10.1117/12.406663

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The EUV light source is a critical factor for the success of Extreme Ultraviolet Lithography (EUVL). ASML, FOM and Philips Research have developed a portable set of diagnostics for the characterization of candidate EUV sources, called Flying Circus. The set of diagnostics is used to perform the following measurements: Absolute EUV power measurements, pulse-to-pulse intensity fluctuations, plasma size and shape, size/shape/positional stability, spectral distribution of radiation and stability, timing jitter and contamination by the source. These measurements are to be performed on-site, at the laboratories of the different source developers. The design as well as the first calibration measurements performed by the Flying Circus (FC) on the FOM Xe double gas jet source and on the PLEX z-pinch source will be discussed.

引用

页码：121 / 127

页数：7

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