A nondiamond phase at the interface between oriented diamond and Si(100) observed by confocal Raman spectroscopy

被引:19
作者
NishitaniGamo, M [1 ]
Ando, T [1 ]
Yamamoto, K [1 ]
Watanabe, K [1 ]
Dennig, PA [1 ]
Sato, Y [1 ]
Sekita, M [1 ]
机构
[1] NIRIM,JAPAN SCI & TECHNOL CORP,CREST,TSUKUBA,IBARAKI 305,JAPAN
关键词
D O I
10.1063/1.118608
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have characterized bias-assisted chemical vapor deposition diamond using the nondestructive technique of confocal Raman spectroscopy to investigate the interfacial structures and the variation in structure and quality with depth. The spectral depth profiles of oriented diamond showed that a band centered at 1210 cm(-1) and the diamond peak at 1332 cm(-1) coexisted at the interface between the oriented diamond and Si substrate, The relative intensity of the 1210 cm(-1) band compared to that of the diamond peak varied with depth. The intensity of the band decreased and that of the diamond peak increased from the interface to the diamond surface. The quality of the oriented diamond improved with the growth time. in contrast, for the case of a randomly oriented diamond, a band centered at 1550 cm(-1) was observed, the diamond peak was shifted between -6 and 6 cm(-1) from the single crystal diamond peak at 1332.5 cm(-1), and the spectral profile did not change with depth. No band at 1210 cm(-1) was seen in this case. We conclude that a nondiamond phase with a Raman band at 1210 cm(-1) and a diamond phase coexist at the interface between the oriented diamond and the Si substrate, and that this 1210 cm(-1) phase is therefore a characteristic feature of the nature of the diamond-substrate bonding in oriented films. (C) 1997 Americnr2 Institute of Physics.
引用
收藏
页码:1530 / 1532
页数:3
相关论文
共 18 条
[1]   CHARACTERIZATION OF FILAMENT-ASSISTED CHEMICAL VAPOR-DEPOSITION DIAMOND FILMS USING RAMAN-SPECTROSCOPY [J].
BUCKLEY, RG ;
MOUSTAKAS, TD ;
LING, Y ;
VARON, J .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (08) :3595-3599
[2]   MICROSTRUCTURAL EVOLUTION OF DIAMOND SI(100) INTERFACES WITH PRETREATMENTS IN CHEMICAL-VAPOR-DEPOSITION [J].
CHEN, CJ ;
CHANG, L ;
LIN, TS ;
CHEN, FR .
JOURNAL OF MATERIALS RESEARCH, 1995, 10 (12) :3041-3049
[3]  
GAMO MN, IN PRESS J MAT RES
[4]   Characterization of heavily B-doped polycrystalline diamond films using Raman spectroscopy and electron spin resonance [J].
Gonon, P ;
Gheeraert, E ;
Deneuville, A ;
Fontaine, F ;
Abello, L ;
Lucazeau, G .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (12) :7059-7062
[5]   DIAMOND EPITAXY ON (001)SILICON - AN INTERFACE INVESTIGATION [J].
JIANG, X ;
JIA, CL .
APPLIED PHYSICS LETTERS, 1995, 67 (09) :1197-1199
[6]   EPITAXIAL DIAMOND THIN-FILMS ON (001) SILICON SUBSTRATES [J].
JIANG, X ;
KLAGES, CP ;
ZACHAI, R ;
HARTWEG, M ;
FUSSER, HJ .
APPLIED PHYSICS LETTERS, 1993, 62 (26) :3438-3440
[7]   HETEROEPITAXIAL DIAMOND GROWTH ON (100) SILICON [J].
JIANG, X ;
KLAGES, CP .
DIAMOND AND RELATED MATERIALS, 1993, 2 (5-7) :1112-1113
[8]   An FTIR study of the heteroepitaxy of diamond on silicon [J].
John, P ;
Graham, C ;
Milne, DK ;
Jubber, MG ;
Wilson, JIB .
DIAMOND AND RELATED MATERIALS, 1996, 5 (3-5) :256-260
[9]   LOW-TEMPERATURE MICRO-PHOTOLUMINESCENCE USING CONFOCAL MICROSCOPY [J].
KASAI, JI ;
KATAYAMA, Y .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1995, 66 (07) :3738-3743
[10]   HETEROEPITAXIAL GROWTH OF SMOOTH AND CONTINUOUS DIAMOND THIN FILMS ON SILICON SUBSTRATES VIA HIGH-QUALITY SILICON-CARBIDE BUFFER LAYERS [J].
KAWARADA, H ;
SUESADA, T ;
NAGASAWA, H .
APPLIED PHYSICS LETTERS, 1995, 66 (05) :583-585