Atomic dipole moment distribution of si atoms on a Si(111)-(7x7) surface studied using noncontact scanning nonlinear dielectric microscopy

被引:43
作者
Cho, Yasuo [1 ]
Hirose, Ryusuke [1 ]
机构
[1] Tohoku Univ, Res Inst Elect Commun, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
D O I
10.1103/PhysRevLett.99.186101
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A local atomic electric dipole moment distribution of Si atoms on Si(111)-(7 x 7) surface is clearly resolved by using a new technique called noncontact scanning nonlinear dielectric microscopy. The dc-bias voltage dependence of the atomic dipole moment on the Si(111)-(7 x 7) surface is measured. At the weak applied voltage of -0.5 V, a positive dipole moment is detected on the Si adatom sites, whereas a negative dipole moment is observed at the interstitial sites of inter Si adatoms. Moreover, the quantitative dependence of the surface dipole moment as a function of the applied dc voltage is also revealed at a fixed point above the sample surface. This is the first successful demonstration of direct atomic dipole moment observation achieved in the field of capacitance measurement.
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页数:4
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