Plasma frequency measurements for absolute plasma density by means of wave cutoff method

被引：115

作者：

Kim, JH ^{[1
]}

Seong, DJ ^{[1
]}

Lim, JY ^{[1
]}

Chung, KH ^{[1
]}

机构：

[1] Korea Res Inst Stand & Sci, Ctr Vacuum Technol, Taejon 305306, South Korea

来源：

APPLIED PHYSICS LETTERS | 2003年 / 83卷 / 23期

关键词：

D O I：

10.1063/1.1632026

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A method for precise measurements of absolute electron density in the plasma using plasma frequency is developed. A microwave perturbation of a frequency is introduced to plasma from a network analyzer and transmits in the plasma. The transmitting wave at a distance from a radiating antenna is monitored using a spectrum analyzer to scan the perturbing frequency. The transmitting wave rapidly decays by a cutoff at the plasma frequency, which gives the absolute electron density. The transmitting waves of some frequency including plasma frequency are characterized. The measured plasma frequency by this method is coincident with that obtained by the plasma oscillation method. (C) 2003 American Institute of Physics.

引用

页码：4725 / 4727

页数：3

共 9 条

[1] A NEW TECHNOLOGY FOR NEGATIVE-ION DETECTION AND THE RAPID ELECTRON COOLING IN A PULSED HIGH-DENSITY ETCHING PLASMA [J].

AHN, TH ;

NAKAMURA, K ;

SUGAI, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (10B) :L1405-L1408

[2]

CHEN FF, 1974, INTRO PLASMA PHYSICS

[3] Measurement of electron density of reactive plasma using a plasma oscillation method [J].

Kanoh, M ;

Tonotani, J ;

Aoki, K ;

Yamage, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6A) :3963-3964

[4] Plasma absorption probe for measuring electron density in an environment soiled with processing plasmas [J].

Kokura, H ;

Nakamura, K ;

Ghanashev, IP ;

Sugai, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (9A) :5262-5266

[5] THE EXCITATION OF PLASMA OSCILLATIONS [J].

LOONEY, DH ;

BROWN, SC .

PHYSICAL REVIEW, 1954, 93 (05) :965-969

[6] Highly sensitive plasma absorption probe for measuring low-density high-pressure plasmas [J].

Nakamura, K ;

Ohata, M ;

Sugai, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (01) :325-331

[7] Electron density measurements in a slot antenna microwave plasma source by means of the plasma oscillation method [J].

Schwabedissen, A ;

Soll, C ;

Brockhaus, A ;

Engemann, J .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (03) :440-447

[8] Comparison of electron density measurements in planar inductively coupled plasmas by means of the plasma oscillation method and Langmuir probes [J].

Schwabedissen, A ;

Benck, EC ;

Roberts, JR .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02) :119-129

[9] PLASMA OSCILLATION METHOD FOR MEASUREMENTS OF ABSOLUTE ELECTRON-DENSITY IN PLASMA [J].

SHIRAKAWA, T ;

SUGAI, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (11A) :5129-5135

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