Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy

被引:25
作者
Gotszalk, T [1 ]
Radojewski, J
Grabiec, PB
Dumania, P
Shi, F
Hudek, P
Rangelow, IW
机构
[1] Wroclaw Univ Technol, Inst Microsyst Technol, PL-50372 Wroclaw, Poland
[2] Inst Electron Technol, PL-02638 Warsaw, Poland
[3] Univ Gesamthsch Kassel, Phys Tech Inst, D-34109 Kassel, Germany
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 06期
关键词
D O I
10.1116/1.590443
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The fabrication and performance of a microprobe with multipurpose capabilities for scanning probe microscopy is presented in this article. Atomic force microscopy (AFM), scanning capacitance microscopy, and electrostatic force microscopy measurements can be simultaneously performed with the probe in which a silicon tip is integrated with a piezoresistive cantilever. Fabrication of the microprobe is based on double side bulk/surface micromachining of silicon on insulator (SOI) substrates. The novelty of this device is a highly doped silicon tip with a curvature radius of about 20 nm which is electrically isolated from the silicon cantilever by the buried oxide layer of the SOI substrate. At the beam supporting point a piezoresistive Wheatstone bridge is fabricated to allow the deflection of the microtip to be monitored. This cantilever displacement detection system enables measurements in vacuum and simplifies the design of the AFM head. Experimental measurements agree well with theoretical estimates of the sensitivity of the microprobe. (C) 1998 American Vacuum Society. [S0734-211X(98)18506-2].
引用
收藏
页码:3948 / 3953
页数:6
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