MOCVD deposition of YSZ on stainless steels

被引：16

作者：

Chevalier, S

Kilo, M

Borchardt, G

Larpin, JP

机构：

[1] Univ Bourgogne, CNRS, UMR 5613, Lab Rech Reactivite Solides, F-21078 Dijon, France

[2] Tech Univ Clausthal, Inst Met, D-38678 Clausthal Zellerfeld, Germany

来源：

APPLIED SURFACE SCIENCE | 2003年 / 205卷 / 1-4期

关键词：

YSZ; Zr(thd)(4); Y(thd)(3); MOCVD; coatings; X-ray diffraction; SNMS profiles;

D O I：

10.1016/S0169-4332(02)01088-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Yttria stabilized zirconia was deposited on stainless steel using the metal-organic chemical vapor deposition (MOCVD) technique, from beta-diketonate precursors. The variation of the evaporation temperatures of yttrium and zirconium precursor allowed to control the level of Y within the film. Over the temperature range 125-150 degreesC, the Y content increased from 2.5 to 17.6 at.%. X-ray diffraction (XRD) analyses evidenced tetragonal phase of zirconia when the Y content was below 8 at.%, and cubic phase for higher concentration. Sputtered neutral mass spectrometry (SNMS) profiles confirmed that the control and stability of Y precursor temperature were of major importance to guarantee the homogeneity of the deposited films. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：188 / 195

页数：8

共 23 条

[11] Structural and optical properties of yttria-stabilized-zirconia films grown by MOCVD [J].