Optical properties of submonolayer germanium clusters formed by molecular-beam epitaxy in a silicon matrix

被引：10

作者：

Cirlin, GÉ ^{[1
]}

Werner, P

Gösele, G

Volovik, BV

Ustinov, VM

Ledentsov, NN

机构：

[1] Max Planck Inst Microstruct Phys, D-06120 Halle, Germany

[2] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 196140, Russia

[3] Tech Univ, Berlin, Germany

[4] Russian Acad Sci, Inst Analyt Instrument Bldg, St Petersburg 196140, Russia

来源：

TECHNICAL PHYSICS LETTERS | 2001年 / 27卷 / 01期

基金：

俄罗斯基础研究基金会;

关键词：

D O I：

10.1134/1.1345154

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Study of the optical properties of submonolayer germanium clusters formed by molecular beam epitaxy in a silicon matrix showed that the spectra of samples obtained at elevated deposition temperatures (similar to 750 degreesC) contain a series of new bands related to the formation of germanium nanoislands. (C) 2001 MAIK "Nauka/Interperiodica".

引用

页码：14 / 16

页数：3

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