Low-frequency noise and mobility fluctuations in AlGaN/GaN heterostructure field-effect transistors

被引:50
作者
Garrido, JA
Foutz, BE
Smart, JA
Shealy, JR
Murphy, MJ
Schaff, WJ
Eastman, LF
Muñoz, E
机构
[1] Cornell Univ, Sch Elect Engn, Ithaca, NY 14853 USA
[2] Univ Politecn Madrid, ETSI Telecomun, Dept Ingn Elect, E-28040 Madrid, Spain
关键词
D O I
10.1063/1.126672
中图分类号
O59 [应用物理学];
学科分类号
摘要
The l/f low-frequency noise characteristics of AlGaN/GaN heterostructure held-effect transistors, grown on sapphire: and SiC substrates by molecular beam epitaxy and organometallic vapor phase epitaxy, are reported. The Hooge parameter is deduced taking into account the effect of the contact noise and the noise originating in the ungated regions. A strong dependence between the Hooge parameter and the sheet carrier density is obtained, and it is explained using a model in which mobility fluctuations are produced by dislocations. A Hooge parameter as low as alpha(CH)approximate to 8 x 10(-5) is determined for devices grown on SiC substrates. (C) 2000 American Institute of Physics. [S0003-6951(00)02623-1].
引用
收藏
页码:3442 / 3444
页数:3
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