Expanding thermal plasma CVD of textured ZnO with focus on solar cell applications

被引：1

作者：

Groenen, R ^{[1
]}

van de Sanden, MCM ^{[1
]}

Löffler, J ^{[1
]}

Schropp, REI ^{[1
]}

Linden, JL ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Phys, NL-5600 MB Eindhoven, Netherlands

来源：

CONFERENCE RECORD OF THE TWENTY-EIGHTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 2000 | 2000年

关键词：

D O I：

10.1109/PVSC.2000.916009

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

A new method for low temperature deposition of surface textured ZnO is presented utilizing an expanding thermal plasma created by a cascaded arc. Films have been deposited at 150-350 degreesC at a rate of typically 0.65-0.75 nm/s, exhibiting low sheet resistance (< 10 Omega/square), high transmittance (> 80%) and a rough surface texture. Surface roughness increases with increasing deposition temperature and film thickness. First pin a-Si:H solar cells deposited on this ZnO show initial efficiencies approaching 10%.

引用

页码：822 / 824

页数：3

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