A study of current transport in (BaxSr1-x)Ti1+yO3+z thin-film capacitors containing a voltage-dependent interface state charge distribution -: art. no. 114101

被引:21
作者
Baniecki, JD [1 ]
Shioga, T [1 ]
Kurihara, K [1 ]
Kamehara, N [1 ]
机构
[1] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
关键词
D O I
10.1063/1.1872201
中图分类号
O59 [应用物理学];
学科分类号
摘要
J-V-T characteristics, measured over a very wide temperature (50-441 K) range, are analyzed simultaneously with C-V measurements to investigate conduction mechanisms and the state of charge of Pt/BaxSr1-xTi1+yO3+z(BST)/Pt thin-film capacitors during an applied voltage or current stress. A time- and voltage-dependent state of charge of the Pt/BST/Pt capacitors is inferred from stress-induced voltage shifts in the C-V curves. The voltage and temperature dependence of the C-V curve shifts is shown to be consistent with a voltage-dependent charge in interface states resulting from a change in potential across interfacial dipole layers. An intimate contact Schottky barrier model incorporating a voltage-dependent charge in interface states at both cathode and anode contacts is used to investigate conduction mechanisms in Pt/BST/Pt thin-film capacitors. The basic transport mechanisms of drift-diffusion, thermionic field emission, and Fowler-Nordeim tunneling are shown to dominate leakage in limiting voltage and temperature regimes. Thermionic emission is not predicted to control current flow at any investigated voltage and temperature. (C) 2005 American Institute of Physics.
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页数:10
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共 52 条
[1]   Thickness dependence of leakage current behavior in epitaxial (Ba,Sr)TiO3 film capacitors [J].
Ahn, KH ;
Kim, SS ;
Baik, S .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (03) :1725-1730
[2]   Dielectric relaxation of Ba0.7Sr0.3TiO3 thin films from 1 mHz to 20 GHz [J].
Baniecki, JD ;
Laibowitz, RB ;
Shaw, TM ;
Duncombe, PR ;
Neumayer, DA ;
Kotecki, DE ;
Shen, H ;
Ma, QY .
APPLIED PHYSICS LETTERS, 1998, 72 (04) :498-500
[3]  
Baniecki JD, 2003, MATER RES SOC SYMP P, V748, P441
[4]   Investigation of the importance of interface and bulk limited transport mechanisms on the leakage current of high dielectric constant thin film capacitors [J].
Baniecki, JD ;
Shioga, T ;
Kurihara, K ;
Kamehara, N .
JOURNAL OF APPLIED PHYSICS, 2003, 94 (10) :6741-6748
[5]   H2O vapor-induced leakage degradation of Pb(Zr,Ti)O3 thin-film capacitors with Pt and IrO2 electrodes [J].
Baniecki, JD ;
Cross, JS ;
Tsukada, M ;
Watanabe, J .
APPLIED PHYSICS LETTERS, 2002, 81 (20) :3837-3839
[6]   Hydrogen induced tunnel emission in Pt/(BaxSr1-x)Ti1+yO3+z/Pt thin film capacitors [J].
Baniecki, JD ;
Laibowitz, RB ;
Shaw, TM ;
Parks, C ;
Lian, J ;
Xu, H ;
Ma, QY .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (05) :2873-2885
[7]   Electric-field penetration into metals: Consequences for high-dielectric-constant capacitors [J].
Black, CT ;
Welser, JJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (04) :776-780
[8]   ELECTRONIC-STRUCTURE OF A METAL-INSULATOR INTERFACE - TOWARDS A THEORY OF NONREACTIVE ADHESION [J].
BORDIER, G ;
NOGUERA, C .
PHYSICAL REVIEW B, 1991, 44 (12) :6361-6371
[9]   CHARGE TRAPPING GENERATION AND RELIABILITY FOR HIGH-PERFORMANCE TANTALUM OXIDE CAPACITORS [J].
BYEON, SG ;
TZENG, Y .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (10) :4837-4842
[10]   ELECTRONIC-TRANSPORT BEHAVIOR IN SINGLE-CRYSTALLINE BA0.03SR0.97TIO3 [J].
CHOI, GM ;
TULLER, HL ;
GOLDSCHMIDT, D .
PHYSICAL REVIEW B, 1986, 34 (10) :6972-6979