Thickness dependence of leakage current behavior in epitaxial (Ba,Sr)TiO3 film capacitors

被引:28
作者
Ahn, KH
Kim, SS
Baik, S
机构
[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea
[2] Chonnam Natl Univ, Dept Mat Sci & Engn, Kwangju 500757, South Korea
关键词
D O I
10.1063/1.1535750
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thickness dependence of leakage current behavior in Pt/(Ba,Sr)TiO3/Pt film capacitors was investigated by fabricating epitaxial (Ba,Sr)TiO3 thin films having different thicknesses of 55-225 nm but with an identical interface state on Pt(001)/MgO(001) substrates by a radio-frequency magnetron sputtering technique. In the 55-nm-thick film, the Schottky emission is found to be a main leakage mechanism over a wide electric field range. In sharp contrast, instead of the Schottky emission, the Fowler-Nordheim tunneling dominates particularly in the thicker films (greater than or equal to90 nm) at high electric fields. According to the energy band model proposed to explain these results, the major leakage conduction mechanism is likely to be associated with overlapping of the depletion layers formed at the top and bottom interfaces. (C) 2003 American Institute of Physics. [DOI: 10.1063/1.1535750].
引用
收藏
页码:1725 / 1730
页数:6
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