Low pressure magnetron sputtering and selfsputtering discharges

被引:41
作者
Kadlec, S [1 ]
Musil, J [1 ]
机构
[1] ACAD SCI CZECH REPUBL,INST PHYS,CR-18040 PRAGUE 8,CZECH REPUBLIC
关键词
D O I
10.1016/0042-207X(96)80013-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Operation of three magnetrons with diameters 100 - 160 mm have been measured at pressures below 0.1 Pa. At low and medium discharge power density less than or equal to 10W/cm(2), stable discharge has been achieved down to the Ar pressure range (1.1-2) x 10(-2) Pa. Discharge characteristics of selfsputtering discharges have been measured in the range of target power densities 2 W/cm(2) to 100 W/cm(2). Selfsputtering of Cu was achieved at power density 57 W/cm(2). Selfsputtering was observed on other five target materials: Ag, Pb, Cd, brass and on Al bronze.
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页码:307 / 311
页数:5
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