Fluorine codoping in germanium to suppress donor diffusion and deactivation

被引:61
作者
Chroneos, A. [1 ]
Grimes, R. W. [1 ]
Bracht, H. [2 ]
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2BP, England
[2] Univ Munster, Inst Mat Phys, D-48149 Munster, Germany
关键词
SILICON;
D O I
10.1063/1.3224900
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electronic structure calculations are used to investigate the stability of fluorine-vacancy (F(n)V(m)) clusters in germanium (Ge). Using mass action analysis, it is predicted that the F(n)V(m) clusters can remediate the concentration of free V considerably. Importantly, we find that F and P codoping leads to a reduction in the concentration of donor-vacancy (DV) pairs. These pairs are responsible for the atomic transport and the formation of D(n)V clusters that lead to a deactivation of donor atoms. The predictions are technologically significant as they point toward an approach by which V-mediated donor diffusion and the formation of inactive D(n)V clusters can be suppressed. This would result in shallow and fully electrically active n-type doped regions in Ge-based electronic devices. (C) 2009 American Institute of Physics. [doi: 10.1063/1.3224900]
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页数:5
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