The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry

被引：36

作者：

Kitson, SC

Barnes, WL

Sambles, JR

机构：

[1] Thin Film Photonics Group, Department of Physics, University of Exeter, Exeter, EX4 4QL, Stocker Road

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 1996年 / 8卷 / 12期

关键词：

D O I：

10.1109/68.544711

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report on the use of multiple-exposure optical interferometry combined with nonlinear development of photoresist to enable the fabrication of hexagonal arrays of dots. The capability of the technique is demonstrated by the fabrication of a hexagonal array of 50-nm-radius dots having a 300-nm periodicity.

引用

收藏

页码：1662 / 1664

页数：3

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