The effect of the H2 flow rate on the structure and optical properties of TiO2 films deposited by inductively coupled plasma assisted chemical vapor deposition

被引：3

作者：

Jang, D. S. ^{[1
]}

Lee, H. Y. ^{[1
]}

Lee, J. J. ^{[1
]}

机构：

[1] Seoul Natl Univ, Coll Engn, Sch Mat Sci & Engn, Plasma Surface Engn Lab, Seoul 151742, South Korea

来源：

THIN SOLID FILMS | 2009年 / 517卷 / 14期

关键词：

Titanium oxide; Inductively coupled plasma (ICP); Hydrogen dilution; Phase transition; PHOTOCATALYTIC ACTIVITY; THIN-FILMS; SILICON; TEMPERATURE; GROWTH;

D O I：

10.1016/j.tsf.2009.01.125

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The optical and photocatalytic properties of TiO2 are closely related to crystalline structures, such as rutile and anatase. In this paper, TiO2 films were produced by inductively coupled plasma (ICP) assisted chemical vapor deposition (CVD) without extra heating of the substrate, and the effect Of H-2 addition on the structure and optical properties of the films was investigated. After increasing the partial pressure of H-2, the structure of the TiO2 films changed from anatase to rutile, which usually appears at high temperatures (>600 degrees C). The light transmittance decreased with increasing the H-2 flow rate due to the increased surface roughness. The photocatalytic activity of the anatase TiO2 film was better than that of the rutile TiO2 film. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：3967 / 3970

页数：4

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