Electron-beam-induced deposition of carbonaceous microstructures using scanning electron microscopy

被引:63
作者
Miura, N [1 ]
Ishii, H [1 ]
Shirakashi, J [1 ]
Yamada, A [1 ]
Konagai, M [1 ]
机构
[1] ELECTROTECH LAB, TSUKUBA, IBARAKI 305, JAPAN
关键词
electron-beam-induced deposition; carbonaceous microstructures; atomic force microscopy; MIM diode;
D O I
10.1016/S0169-4332(96)00767-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Scanning electron microscopy (SEM) was utilized for deposition of carbonaceous microstructures. Conic-, wire- and square-shaped structures were fabricated with various scanning modes. A narrow carbonaceous wire with a width of 30 nm was obtained at an electron-beam current of 15 pA. The conic-structure was successfully applied to a cantilever of an atomic force microscope (AFM) and a planar resolution was extremely improved. Furthermore, the square-shaped structure was also employed as the insulator in a metal-insulator-metal (MIM) diode and a clear non-linear I-V characteristic was observed at room temperature.
引用
收藏
页码:269 / 273
页数:5
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