Lithographical laser ablation using femtosecond laser

被引：40

作者：

Nakata, Y ^{[1
]}

Okada, T ^{[1
]}

Maeda, M ^{[1
]}

机构：

[1] Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Fukuoka 8128581, Japan

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2004年 / 79卷 / 4-6期

关键词：

D O I：

10.1007/s00339-004-2825-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Lithographical laser ablation was demonstrated using a femtosecond laser with a lithographical optical system. In this method, a femtosecond laser beam passes through a mask and the pattern is imaged on a film by a coherent optical system. As a result, the film is lithographically ablated, and a micron-sized pattern can be generated in a single shot. The resolution of generation was 13 mum, and the narrowest width of a generated line was about 4 mum. Moreover, the system was applied to transmission gratings as masks, and nano-sized periodic structures such as nano-sized hole matrices and nano-meshes were generated in a single shot.

引用

页码：1481 / 1483

页数：3

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