Room-temperature minority-carrier injection-enhanced recovery of radiation-induced defects in p-InGaP and solar cells

被引:43
作者
Khan, A
Yamaguchi, M
Bourgoin, JC
de Angelis, N
Takamoto, T
机构
[1] Toyota Technol Inst, Tempa Ku, Nagoya, Aichi 4688511, Japan
[2] Univ Paris 06, CNRS, Lab Milieux Desordonnes & Heterogenes, UMR 7603, F-75252 Paris 05, France
[3] Japan Energy Corp, Cent Res Lab, Toda, Saitama 335, Japan
关键词
D O I
10.1063/1.126407
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present here the direct observation of minority-carrier injection-enhanced annealing of radiation-induced defects in metalorganic chemical vapor deposition grown p-InGaP at room temperature, and the consequent recovery of radiation damage in InGaP n(+)-p junction solar cells. Deep level transient spectroscopy analysis shows that the main defect H2 (E-upsilon + 0.55 eV) in p-InGaP exhibits minority-carrier injection-enhanced annealing characterized by an activation energy (Delta E=0.51 eV) close to the activation energy for the recovery (Delta E=0.54 eV) of the defect responsible for diffusion length degradation in n(+)-p solar cells. The marked recovery of radiation damage in InGaP solar cells induced by minority-carrier injection is found to be correlated with the annihilation of the H2 defect. (C) 2000 American Institute of Physics. [S0003-6951(00)00118-2].
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页码:2559 / 2561
页数:3
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