Fabrication of nanometric zinc pattern with photodissociated gas-phase diethylzinc by optical near field

In situ patterning of zinc on a nanometric scale has been accomplished by photodissociation of gas-phase diethylzinc by optical near field. By using an ultraviolet optical fiber probe with an aperture diameter of 60 nm, dots with full width at half maxima of 60 and 70 nm were deposited, and were separated by 100 nm. The aspect ratio of the dots increased at the rate of 0.03/mu J, as the optical near field energy increased. A T-shape pattern was also fabricated by scanning the probe in an optical near field microscope system. (C) 2000 American Institute of Physics. [S0003-6951(00)04616-7].