Plasma source ion implantation of metal ions: Synchronization of cathodic-arc plasma production and target bias pulses

被引：15

作者：

Wood, BP

Reass, WA

Henins, I

机构：

[1] Los Alamos National Laboratory, Los Alamos

来源：

SURFACE & COATINGS TECHNOLOGY | 1996年 / 85卷 / 1-2期

关键词：

vacuum are; cathodic are; plasma source ion implantation; metal; plasma; erbium;

D O I：

10.1016/0257-8972(96)02875-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

An erbium cathodic-arc has been installed on a plasma source ion implantation (PSII) experiment to allow the implantation of erbium metal and the growth of adherent erbia (erbium oxide) films on a variety of substrates. The operation of the PSII pulser and the cathodic-arc are synchronized to achieve pure implantation, rather than the hybrid implantation/deposition being investigated in other laboratories. The relative phase of the 20 mu s PSII and the cathodic-arc pulses can be adjusted to tailor the energy distribution of the implanted ions and suppress the initial high-current drain on the pulse modulator. We present experimental data on this effect and make a comparison with the results from particle-in-cell simulations.

引用

页码：70 / 74

页数：5

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