Measured and calculated dose distribution for 2D plasma immersion ion implantation

被引:15
作者
Mandl, S
Reuther, H
Brutscher, J
Gunzel, R
Moller, W
机构
[1] Research Center Rossendorf, Inc., Inst. Ion Beam Phys. and Mat. Res., PO Box 51 01 19
关键词
plasma immersion ion implantation; computer simulation; AES; plasma sheath;
D O I
10.1016/S0257-8972(97)00050-9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nitrogen was implanted into four cylinders (height 37 mm and diameter 4, 6, 8, and 12 mm) covered with aluminum foil using plasma immersion ion implantation at 30 kV. The homogeneity of the implantation, i.e. the spatial variation of the implanted dose, was determined for selected points on the top and the side walls of the cylinders with sputter depth profiling using Auger electron spectroscopy. Calculations approximating the dynamic sheath evolution with discrete sheath positions were performed to obtain the variation of the implanted dose and angle of incidence. Good agreement is found between the calculations and the experimental data. The ion dose exhibits a maximum on the top and decreases on the side walls. A second maximum is formed on the wall of the cylinder. The total dose variation is of the order of 50%. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:229 / 233
页数:5
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