Characteristics of ultraviolet-assisted pulsed-laser-deposited Y2O3 thin films

被引：16

作者：

Craciun, V ^{[1
]}

Lambers, ES

Bassim, ND

Singh, RK

Craciun, D

机构：

[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA

[2] Natl Inst Laser Plasma & Radiat Phys, Laser Dept, Bucharest, Romania

[3] Inst Atom Phys, R-76900 Bucharest, Romania

来源：

JOURNAL OF MATERIALS RESEARCH | 2000年 / 15卷 / 02期

关键词：

D O I：

10.1557/JMR.2000.0073

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The properties of thin Y2O3 films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (PLD) technique were studied. With respect to Y2O3 films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD-grown films exhibited better structural and optical properties, especially for lower substrate temperatures, from 340 to 400 degrees C. These layers were highly crystalline and textured along the (111) direction, and their refractive index values were similar to those of reference Y2O3 layers. They also exhibited a better stoichiometry and contained less physisorbed oxygen than the conventional PLD-grown layers.

引用

页码：488 / 494

页数：7

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