Polarity determination for GaN thin films by electron energy-loss spectroscopy

被引:17
作者
Kong, X
Hu, GQ
Duan, XF
Lu, Y
Liu, XL
机构
[1] Chinese Acad Sci, Beijing Lab Electron Microscopy, Inst Phys, Beijing 100080, Peoples R China
[2] Chinese Acad Sci, Ctr Condensed Matter Phys, Beijing 100080, Peoples R China
[3] Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
关键词
D O I
10.1063/1.1504876
中图分类号
O59 [应用物理学];
学科分类号
摘要
The intensity of the N K edge in electron energy-loss spectra from a GaN thin film shows a pronounced difference when the orientation of the film approaches the (0002) and (000-2) Bragg reflections, along the polar direction. This experimental result can be interpreted by the effect associated with interference between the Bloch waves of the incident electron in the GaN crystal. The theoretical calculations indicate that, at the Bragg condition of g=0002 along the Ga-N bond direction, the thickness-averaged electron current density on the N atom plane is much higher than that at g=000 (2) over bar, with a maximum as the specimen thickness is about 0.4xi(0002) (the two-beam extinction distance). The delocalization effect on the experimental spectra is also discussed. (C) 2002 American Institute of Physics.
引用
收藏
页码:1990 / 1992
页数:3
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