Combined focused ion beam deposition system and scanning probe microscope for metal nanostructure fabrication and characterization

被引：4

作者：

Woodham, RG ^{[1
]}

Ahmed, H ^{[1
]}

机构：

[1] Cavendish Lab, Ctr Microelect Res, Cambridge CB3 OHE, England

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.590957

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 [电气工程]; 0809 [电子科学与技术];

摘要：

We have developed a combined focused ion beam deposition machine and scanning probe microscope which has been used to fabricate and characterize metal nanoparticles entirely within a high-vacuum environment. The focused ion beam section is fitted with a retarding-field stage which allows the landing energy of ions to be adjusted from similar to 20 to over 400 eV. The microscope has been adapted to enable the probe to be directed to the localized deposits so that the physical structure of the deposits and the electrical properties can be measured in situ. (C) 1999 American Vacuum Society. [S0734-211X(99)18606-2].

引用

页码：3075 / 3079

页数：5

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