Microstructures and dielectric properties of PZT thick films prepared by aerosol plasma deposition with microwave annealing

Lead zirconate titanate (PZT) thick films have been successfully grown on Pt/Ti-coated (10 0) Si substrates by a novel aerosol plasma deposition (APD) method at room temperature. The dielectric constant (K) and loss tangent (tan delta) of the as-deposited film measured at 100 kHz are 223 and 0.034, respectively. The dielectric properties of the film are improved considerably by subsequent microwave annealing: K = 745 and tan delta = 0.024 are achieved for films which are microwave-annealed at 600 W for 3 min, and K= 1049, tan delta = 0.027, and remanent polarization (P-r) = 32 mu C cm(-2) for films annealed at 800 W for 3 min. These values are comparable to those of PZT films grown by conventional deposition methods with high substrate and/or post-annealing temperatures. (c) 2006 Elsevier B.V All rights reserved.