Super-resolution in laser annealing and ablation

被引:24
作者
Avrutsky, I [1 ]
Georgiev, DG
Frankstein, D
Auner, G
Newaz, G
机构
[1] Wayne State Univ, Dept Elect & Comp Engn, Detroit, MI 48202 USA
[2] Wayne State Univ, Dept Mech Engn, Detroit, MI 48202 USA
关键词
D O I
10.1063/1.1688995
中图分类号
O59 [应用物理学];
学科分类号
摘要
This letter reports observation of ablated holes as small as 0.7 mum fabricated by single 25 ns pulses of KrF (lambda = 248 nm) laser focused onto a 5.6 mum spot. Samples with high thermal conductivity films with respect to that of the substrate (Si/silica, Al/glass) repeatedly showed considerable reduction in the size of the ablated spot (0.7- and 1.2-mum-diam holes, respectively). This letter also presents a likely mechanism of the observed super-resolution and the criteria necessary to achieve super-resolution. Due-to the nonoptical origin of this effect it is expected that a tightly focused (<0.5 μm) laser beam can be used to ablate with nanoscale (<100 nm) resolution. (C) 2004 American Institute of Physics.
引用
收藏
页码:2391 / 2393
页数:3
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