Methods for preparing patterned media for high-density recording

被引：67

作者：

Lodder, JC ^{[1
]}

机构：

[1] Univ Twente, MESA Res Inst, NL-7500 AE Enschede, Netherlands

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2004年 / 272卷

关键词：

magnetic recording; nanolithography;

D O I：

10.1016/j.jmmm.2003.12.259

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The areal bit density of magnetic disk recording has made a colossal increase over the last decades. Extrapolation leads to recording parameters not likely to be achieved without changes in the present way of storing magnetic data. One of the potential solutions is the use of patterned media, which should consist of a regular two-dimensional array of single domain dots with large uniaxial magnetic anisotropy. Such media will shift the super paramagnetic limit positively in comparison with the present thin film media. Theoretically, a bit density in the order of Tbpsi is possible. This paper will discuss the most valuable methods for preparing patterned media. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：1692 / 1697

页数：6

共 54 条

[1] Magnetization reversal in arrays of perpendicularly magnetized ultrathin dots coupled by dipolar interaction [J].

Aign, T ;

Meyer, P ;

Lemerle, S ;

Jamet, JP ;

Ferré, J ;

Mathet, V ;

Chappert, C ;

Gierak, J ;

Vieu, C ;

Rousseaux, F ;

Launois, H ;

Bernas, H .

PHYSICAL REVIEW LETTERS, 1998, 81 (25) :5656-5659

[2] Writing of high-density patterned perpendicular media with a conventional longitudinal recording head [J].

Albrecht, M ;

Moser, A ;

Rettner, CT ;

Anders, S ;

Thomson, T ;

Terris, BD .

APPLIED PHYSICS LETTERS, 2002, 80 (18) :3409-3411

[3] Recording performance of high-density patterned perpendicular magnetic media [J].

Albrecht, M ;

Rettner, CT ;

Moser, A ;

Best, ME ;

Terris, BD .

APPLIED PHYSICS LETTERS, 2002, 81 (15) :2875-2877

[4] Local modification of magnetic properties by an electron beam [J].

Allenspach, R ;

Bischof, A ;

Dürig, U ;

Grütter, P .

APPLIED PHYSICS LETTERS, 1998, 73 (24) :3598-3600

[5] HOLOGRAPHIC LITHOGRAPHY WITH THICK PHOTORESIST [J].

ANDERSON, EH ;

HORWITZ, CM ;

SMITH, HI .

APPLIED PHYSICS LETTERS, 1983, 43 (09) :874-875

[6] Step and flash imprint lithography: Template surface treatment and defect analysis [J].

Bailey, T ;

Choi, BJ ;

Colburn, M ;

Meissl, M ;

Shaya, S ;

Ekerdt, JG ;

Sreenivasan, SV ;

Willson, CG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3572-3577

[7] Fabrication of high density nanostructures gratings (>500Gbit/in2) used as molds for nanoimprint lithography [J].

Carcenac, F ;

Vieu, C ;

Lebib, A ;

Chen, Y ;

Manin-Ferlazzo, L ;

Launois, H .

MICROELECTRONIC ENGINEERING, 2000, 53 (1-4) :163-166

[8] EFFECT OF ENERGETIC BOMBARDMENT ON THE MAGNETIC COERCIVITY OF SPUTTERED PT/CO THIN-FILM MULTILAYERS [J].

CARCIA, PF ;

SHAH, SI ;

ZEPER, WB .

APPLIED PHYSICS LETTERS, 1990, 56 (23) :2345-2347

[9] Magnetization reversal of nanostructured Co/Pt multilayer dots and films studied with magnetic force microscopy and MOKE [J].

Carl, A ;

Kirsch, S ;

Lohau, J ;

Weinforth, H ;

Wassermann, EF .

IEEE TRANSACTIONS ON MAGNETICS, 1999, 35 (05) :3106-3111

[10] Planar patterned magnetic media obtained by ion irradiation [J].

Chappert, C ;

Bernas, H ;

Ferré, J ;

Kottler, V ;

Jamet, JP ;

Chen, Y ;

Cambril, E ;

Devolder, T ;

Rousseaux, F ;

Mathet, V ;

Launois, H .

SCIENCE, 1998, 280 (5371) :1919-1922

← 1 2 3 4 5 6 →