Step bunching of vicinal 6H-SiC{0001} surfaces

被引:59
作者
Borovikov, Valery [1 ]
Zangwill, Andrew [1 ]
机构
[1] Georgia Inst Technol, Sch Phys, Atlanta, GA 30332 USA
关键词
CHEMICAL-VAPOR-DEPOSITION; AXIS; 0001; FACES; SILICON-CARBIDE; DEFECT FORMATION; CRYSTAL-GROWTH; THIN-FILMS; EVOLUTION; HOMOEPITAXY; EPITAXY; 6H;
D O I
10.1103/PhysRevB.79.245413
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We use kinetic Monte Carlo simulations to understand growth-induced and etching-induced step bunching of 6H-SiC{0001} vicinal surfaces oriented toward < 1 (1) over bar 00 > and < 11 (2) over bar0 >. By taking account of the different rates of surface diffusion on three inequivalent terraces, we reproduce the experimentally observed tendency for single bilayer height steps to bunch into half unit-cell height steps. By taking account of the different mobilities of steps with different structures, we reproduce the experimentally observed tendency for adjacent pairs of half unit-cell height steps to bunch into full unit-cell height steps. A prediction of our simulations is that growth-induced and etching-induced step bunching lead to different surface terminations for the exposed terraces when full unit-cell height steps are present.
引用
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页数:9
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