Radiation hardness of polycrystalline diamond thin films irradiated with 100 MeV I7+ ions

被引:13
作者
Dilawar, N
Kapil, R
Vankar, VD
Avasthi, DK
Kabiraj, D
Mehta, GK
机构
[1] INDIAN INST TECHNOL,DEPT PHYS,THIN FILM LAB,NEW DELHI 110016,INDIA
[2] CTR NUCL SCI,NEW DELHI 110067,INDIA
关键词
chemical vapour deposition (CVD); diamond; ion bombardment; radiation damage;
D O I
10.1016/S0040-6090(97)00167-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Polycrystalline diamond thin films grown by hot-filament chemical vapour deposition (CVD) process were irradiated with 100 MeV I7+ ions. The as-deposited and irradiated films were characterized using micro-Raman spectroscopy, glancing angle X-ray diffraction (XRD), resistivity measurements and scanning electron microscopy (SEM) techniques. Defects and non-diamond carbon phases were seen to develop on irradiation up to a fluence of 1.3 X 10(14) ions/cm(2). The extent of damage to the films was found to be critically dependent on the crystalline quality of the film. The resulting changes were correlated with the hydrogen concentrations in the films as studied by elastic recoil detection analysis. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:88 / 94
页数:7
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