Fabrication and characterization of an InAlAs/InGaAs/InP ring oscillator using integrated enhancement- and depletion-mode high-electron mobility transistors

被引:24
作者
Mahajan, A [1 ]
Cueva, G [1 ]
Arafa, M [1 ]
Fay, P [1 ]
Adesida, I [1 ]
机构
[1] UNIV ILLINOIS, DEPT ELECT & COMP ENGN, URBANA, IL 61801 USA
关键词
D O I
10.1109/55.605449
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The fabrication and characterization of an 11-stage ring oscillator utilizing integrated enhancement- and depletion-mode (E/D-mode) high-electron mobility transistors (HEMT's) in the lattice-matched InAlAs/InGaAs/InGaAs material system is demonstrated. The 0.5-mu m gate length depletion-mode HEMT's (D-HEMT's) used in the circuit exhibit a threshold voltage (V-T) of -365 mV with a standard deviation of 19 mV, while the enhancement-mode HEMT's (E-HEMT's) with identical gate length display a V-T of 195 mV with a standard deviation of only 9 mV. The unity current gain cutoff frequency (f(t)) for both devices is 70 GHz. The extremely high uniformity of the threshold voltages of these devices allowed for the implementation of a ring oscillator utilizing direct coupled FET logic (DCFL). At a supply voltage of 0.4 V, a room temperature propagation delay time (tau(pd)) of 22.4 ps/stage, and a corresponding power dissipation of 120 mu W/stage is measured, yielding a power delay product (PDP) of 2.65 fJ/stage. To the best of the authors' knowledge, this is the first demonstration of a circuit employing E/D-HEMT technology in the lattice-matched InP-based material system.
引用
收藏
页码:391 / 393
页数:3
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