Electron beam deposition of ZrO2-ZnO films

被引：20

作者：

Qadri, SB

Skelton, EF

Lubitz, P

Nguyen, NV

Khan, HR

机构：

[1] NATL INST STAND & TECHNOL, DIV SEMICOND ELECT, GAITHERSBURG, MD 20899 USA

[2] FORSCHUNGSINST EDELMET & MET CHEM, D-73525 SCHWABISCH GMUND, GERMANY

来源：

THIN SOLID FILMS | 1996年 / 290卷

关键词：

ellipsometry; X-ray fluorescence;

D O I：

10.1016/S0040-6090(96)09195-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of zirconia-zincia (ZrO2-ZnO) have been produced by an electron beam evaporation technique. Two separate targets of ZrO2 and ZnO were used and a range of composition was selected from 10 to 60 wt.% of zinc. The final compositions of the deposited films were determined by X-ray fluorescence. Films deposited at 300 degrees C all crystallized in the cubic phase of ZrO2. The refractive indices of these films were measured by an ellipsometric technique. Preliminary electrical resistivity measurements as a function of temperature are also presented.

引用

页码：80 / 83

页数：4

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